461 research outputs found

    Feasibility of using T-shaped feedback in teraohmmeters

    Get PDF
    The paper investigates the feasibility of using T-shaped feedback in teraohmmeters. Theoretical and experimental dependences of the output voltage of the T-shaped feedback converter on the measured resistance and circuit parameters are obtained. The use of T-shaped feedback is found to decrease the reference resistance rating from 10 GOhm to 100 Ohm that indicates 100-fold reduction (with an error of less than 1%)

    Density of States and Conductivity of Granular Metal or Array of Quantum Dots

    Full text link
    The conductivity of a granular metal or an array of quantum dots usually has the temperature dependence associated with variable range hopping within the soft Coulomb gap of density of states. This is difficult to explain because neutral dots have a hard charging gap at the Fermi level. We show that uncontrolled or intentional doping of the insulator around dots by donors leads to random charging of dots and finite bare density of states at the Fermi level. Then Coulomb interactions between electrons of distant dots results in the a soft Coulomb gap. We show that in a sparse array of dots the bare density of states oscillates as a function of concentration of donors and causes periodic changes in the temperature dependence of conductivity. In a dense array of dots the bare density of states is totally smeared if there are several donors per dot in the insulator.Comment: 13 pages, 15 figures. Some misprints are fixed. Some figures are dropped. Some small changes are given to improve the organizatio

    AC Conductance in Dense Array of the Ge0.7_{0.7}Si0.3_{0.3} Quantum Dots in Si

    Full text link
    Complex AC-conductance, σAC\sigma^{AC}, in the systems with dense Ge0.7_{0.7}Si0.3_{0.3} quantum dot (QD) arrays in Si has been determined from simultaneous measurements of attenuation, ΔΓ=Γ(H)Γ(0)\Delta\Gamma=\Gamma(H)-\Gamma(0), and velocity, ΔV/V=(V(H)V(0))/V(0)\Delta V /V=(V(H)-V(0)) / V(0), of surface acoustic waves (SAW) with frequencies ff = 30-300 MHz as functions of transverse magnetic field HH \leq 18 T in the temperature range TT = 1-20 K. It has been shown that in the sample with dopant (B) concentration 8.2×1011 \times 10^{11} cm2^{-2} at temperatures TT \leq4 K the AC conductivity is dominated by hopping between states localized in different QDs. The observed power-law temperature dependence, σ1(H=0)T2.4\sigma_1(H=0)\propto T^{2.4}, and weak frequency dependence, σ1(H=0)ω0\sigma_1(H=0)\propto \omega^0, of the AC conductivity are consistent with predictions of the two-site model for AC hopping conductivity for the case of ωτ0\omega \tau_0 \gg 1, where ω=2πf\omega=2\pi f is the SAW angular frequency and τ0\tau_0 is the typical population relaxation time. At T>T > 7 K the AC conductivity is due to thermal activation of the carriers (holes) to the mobility edge. In intermediate temperature region 4<T< < T< 7 K, where AC conductivity is due to a combination of hops between QDs and diffusion on the mobility edge, one succeeded to separate both contributions. Temperature dependence of hopping contribution to the conductivity above TT^*\sim 4.5 K saturates, evidencing crossover to the regime where ωτ0<\omega \tau_0 < 1. From crossover condition, ωτ0(T)\omega \tau_0(T^*) = 1, the typical value, τ0\tau_0, of the relaxation time has been determined.Comment: revtex, 3 pages, 6 figure

    Ge quantum dot arrays grown by ultrahigh vacuum molecular beam epitaxy on the Si(001) surface: nucleation, morphology and CMOS compatibility

    Get PDF
    Issues of morphology, nucleation and growth of Ge cluster arrays deposited by ultrahigh vacuum molecular beam epitaxy on the Si(001) surface are considered. Difference in nucleation of quantum dots during Ge deposition at low (<600 deg C) and high (>600 deg. C) temperatures is studied by high resolution scanning tunneling microscopy. The atomic models of growth of both species of Ge huts---pyramids and wedges---are proposed. The growth cycle of Ge QD arrays at low temperatures is explored. A problem of lowering of the array formation temperature is discussed with the focus on CMOS compatibility of the entire process; a special attention is paid upon approaches to reduction of treatment temperature during the Si(001) surface pre-growth cleaning, which is at once a key and the highest-temperature phase of the Ge/Si(001) quantum dot dense array formation process. The temperature of the Si clean surface preparation, the final high-temperature step of which is, as a rule, carried out directly in the MBE chamber just before the structure deposition, determines the compatibility of formation process of Ge-QD-array based devices with the CMOS manufacturing cycle. Silicon surface hydrogenation at the final stage of its wet chemical etching during the preliminary cleaning is proposed as a possible way of efficient reduction of the Si wafer pre-growth annealing temperature.Comment: 30 pages, 11 figure

    Phonon bottleneck in p-type Ge/Si quantum dots

    Get PDF
    We study the effect of quantum dot size on the mid-infrared photo- and dark current, photoconductive gain, and hole capture probability in ten-period p-type Ge/Si quantum dot heterostructures. The dot dimensions are varied by changing the Ge coverage and the growth temperature during molecular beam epitaxy of Ge/Si(001) system in the Stranski-Krastanov growth mode. In all samples, we observed the general tendency: with decreasing the size of the dots, the dark current and hole capture probability are reduced, while the photoconductive gain and photoresponse are enhanced. Suppression of the hole capture probability in small-sized quantum dots is attributed to a quenched electron-phonon scattering due to phonon bottleneck
    corecore